- Thin film deposition of advanced materials by a number of techniques such as ion beam assisted deposition (IBAD), magnetron sputtering, electron beam evaporation, and metal organic chemical vapor deposition (MOCVD).
- Single crystalline-like thin films on lattice mismatched, polycrystalline, and amorphous flexible substrates.
- Epitaxial thin film growth of complex materials such as perovskites, bixbyites, rock salts, fluorites and pyrochlores and amorphous films for a variety of applications
- Complex thin films on flexible substrates by reel-to-reel deposition
- Nanowire growth on practical substrates for various energy applications
- Texture evolution and grain boundary control
- Nucleation and growth kinetics in vapor phase and liquid phase growth
- Control of nano-scale interfacial and bulk defects in thin films and bulk materials to tailor properties to meet application needs
- Solidification processing of near-single crystalline bulk advanced materials
- Advanced thin film, nanowire and bulk materials for various energy and electronics applications using superconductors, photovoltaics, flexible electronics, solid-state lighting and thermoelectrics. Click Here
Publication list of group 2009-present Click Here
Conference Presentations and Invited Lectures of group, 2008 – present Click Here
"Unique, state-of-the-art equipment is available for thin film and bulk processing and characterization of complex materials" Click Here
A 13,000 sq. ft. facility for Energy and Electronics Devices Manufacturing with state-of-the-art and unique equipment has been established
Additional advanced characterization facilities are available through our affliation with the Texas Center for Superconductivity at University of Houston (TCSUH)
A partial list of materials characterization tools that is available include JEOL JSM-6330F scanning electron microscope (SEM) with energy dispersive X-ray spectroscopy (EDS), electron backscattered diffraction (EBSD), LEO 1525 Field Emission SEM, JEOL JEM-2000 and JEOL JEM-2010F Transmission Electron Microscopes (TEM), the latter with Gatan 666 Parallel Electron Energy Loss Spectrometer (EELS), Bruker D5000 X-ray Diffractometer (XRD) and Bruker GADDS XRD, JEOL JXA8600 Microprobe equipped four wavelength dispersive spectrometers (WDS), Veeco Dimension 3100 Atomic Force Microscope (AFM), and PHI Model 5700 X-Ray Photoelectron Spectrometer (XPS).
New equipment are also being procured through the recently awarded $ 3.5 M Emerging Technology Fund from the state of Texas ( http://www.egr.uh.edu/news/0210/?e=etf )