Prof. Selvamanickam's Research Group
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Metal Organic Chemical Vapor Deposition system


A metal organic chemical vapor deposition (MOCVD) system equipped with reel-to-reel substrate tape handling, high capacity evaporator and high temperature deposition capability is available. The reel-to-reel system enables continuous deposition of moving tapes which is very beneficial for conducting multiple deposition experiments under different conditions in the same run as well as to fabricate longer sample lengths. Substrate deposition temperature up to 850 C is achievable. A high-capacity, high-temperature evaporator enables high deposition rate of oxide films (~ 0.5 micron/minute) of MOCVD precursors that have high vaporization temperatures such as Ba-tetramethyl heptanedionate.

Plasma Assisted MOCVD system

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